4, ammonia (NH3) : the film forming gas of nitriding film in the electronics industry, is an important "nitrogen" source of chemical vapor deposition
In the microelectronics industry, high purity ammonia is one of the indispensable raw materials. It is mainly used in the growth process of silicon nitride mask in semiconductor device and integrated circuit manufacturing and nitrogen doped process in manufacturing gallium phosphide green luminous materials. When the silicon wafer is deposited and grows the silicon nitride mask, even if the high purity ammonia contains only 50 parts per million of trace water, only silicon oxide is obtained, rather than the required silicon nitride. Also containing trace oxygen (greater than 3 parts per million) of ammonia for gallium phosphide nitrogen will bring deep level of oxygen impurities, so that the diode emitted green light (wavelength 500nm) doped with infrared light (wavelength 900nm) and red light (wavelength 700nm), high purity ammonia in the oil and other impurities on the semiconductor device is also quite large harm.
5, nitrogen trifluoride (NF3) : gas cleaning agent, at present, the domestic technology monopoly has been broken
The melting point of nitrogen trifluoride is -208.5°C, the boiling point is -129°C, and the relative density of the liquid at the boiling point is 1.89. NF3 is the most stable of nitrogen trihalides, but it explodes violently when mixed with water, hydrogen, ammonia, carbon monoxide or hydrogen sulfide. High purity NF3 is almost odorless, it is a thermodynamically stable oxidizing agent, at about 350°C can decompose into nitrogen difluoride and fluorine gas, can react with many elements at high temperatures, can be used as a free radical supply source. Perfluorocarbons (PFCS), which are harmful to the environment as industrial gas cleaners for semiconductors, have been gradually replaced by NF3 in recent years. Using a CVD box that is more stable and easier to handle than F2, it can reduce pollutant emissions by about 90% compared to PFC, and can significantly improve the cleaning speed, which can increase the cleaning equipment capacity by about 30%. NF3 is also an excellent plasma etching gas in the microelectronics industry, etching silicon and silicon nitride, has a higher etching rate and selectivity, and no pollution to the surface, especially in less than 1.5μm of integrated circuit materials can be heavy, NF3 has a very good moment rate and selectivity, leaving no residue on the etched surface.
3. Current status of electronic gases in China
In semiconductor materials, electronic gases are the second largest market demand after large silicon wafers, accounting for 14% of the semiconductor materials market in 2016. With the development of the semiconductor industry, the electronic gas market has also grown. The global electronic specialty gases market was $3.89 billion in 2016 and grew to $4.512 billion in 2018, an increase of 15.93% from 2016. With the transfer of the global semiconductor industry chain to the domestic, the domestic electronic gas market has accelerated significantly, far higher than the global growth rate. According to the statistics of the China Semiconductor Industry Association, from 2010 to 2018, the market size of China's electronic special gas industry has maintained a rapid development trend, reaching 12.156 billion yuan in 2018, an increase of 11.19% compared with 2017.
In recent years, the domestic semiconductor market has developed rapidly, and the production capacity under construction and planned for future construction has provided a broad space for electronic gases. With the development of semiconductor integrated circuit technology, the purity and quality of electronic gases are increasingly required. Every order of magnitude increase in the purity of electronic gases will have a huge impact on the downstream integrated circuit industry. In 2014, the state issued the "National Integrated Circuit Industry Development and Promotion Outline" and established the integrated circuit industry investment fund, according to the plan, the average annual growth rate of China's integrated circuit sales will remain at about 20%, is expected to reach 870 billion yuan in 2020. If the domestic electronic gas for semiconductor integrated circuits maintains the same stable growth rate, its market size in 2020 will increase by 44% on the basis of 2018.
1, the industry concentration is high, and local enterprises are gradually rising
After years of development and mergers and acquisitions, the global industrial gas market has formed a market pattern in which a few gas producers occupy the majority share of the global market. According to SAI Corporation statistics: In the global industrial gas market in 2013, the top four manufacturers in the global industrial gas market, The top four manufacturers - France's Air Liquide Group (ALAL), Germany's Linde Group (Linde), the United States PRAXAIR Group (PRAXAIR) and the United States Air Chemical Products group (AirProducts) together account for 75% of the market share, the market is highly concentrated. On October 23, 2018, Linde Group announced the merger of equals with Praxair Group of the United States to become the world's largest industrial gas business supplier business supplier, and in the same year, the three gas giants (Linde, liquefied Air, air Chemicals) accounted for 76.71% of the global industrial gas outsourcing market. Compared with traditional bulk gases, the electronic gas industry has a high market concentration due to high technical barriers. In the global semiconductor electronic gas market in 2018, five major companies such as Air Chemical of the United States, Praxair of the United States, Linde Group of Germany, Air Liquide of France and Dayo Nippon Acid Co., LTD., controlled more than 90% of the global market share, forming an oligopoly situation. In the domestic market, several leading overseas enterprises also control 85% of the share, China's electronic gas is subject to the situation is very serious.
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