The ASML SVG 879-0794-001 is a precision optical assembly originally developed by Silicon Valley Group (SVG) for the Micrascan series of step-and-scan lithography tools, now fully integrated into ASML’s product portfolio. This Axiom assembly is a critical component that conditions and shapes the illumination beam before it reaches the reticle. It incorporates advanced refractive and diffractive elements to achieve uniform intensity distribution and high coherence control, essential for printing sub-200 nm features.
Part Number: 879-0794-001
Compatible Systems: SVG Micrascan, ASML Micrascan series
Optical Type: Hybrid refractive-diffractive beam homogenizer
Wavelength Range: 248 nm (KrF) and 193 nm (ArF) compatible
Aperture Size: 120 mm x 80 mm
Uniformity: < ±1.5% over full field
Coherence Factor: Adjustable 0.3 to 0.8
Mounting: Kinematic base with three-point suspension
Material: UV-grade fused silica, CaF2
The 879-0794-001 Axiom assembly consists of a fly’s-eye integrator, a field lens array, and a variable diffuser. The integrator breaks the incoming laser beam into multiple secondary sources, which are then recombined to create a highly uniform illumination field. The diffuser element allows adjustment of the spatial coherence, enabling engineers to tailor the pupil fill for different reticle patterns. This flexibility is crucial for optimizing depth of focus and critical dimension control in advanced lithography processes.
Installing the 879-0794-001 requires careful optical alignment using a dedicated autocollimator and laser-based fiducials. The assembly is mounted on a vibration-damped table; after securing the kinematic mounts, technicians must perform a six-degree-of-freedom adjustment to align the optical axis with the subsequent beam train. The procedure includes setting the correct tilt and decentering to within ±10 µm. Once aligned, the position is locked with clamping screws and verified using an interferometer.
After installation, a full calibration routine is executed to measure the illumination uniformity and coherence. The ASML service software provides an interactive interface for adjusting the diffuser position and field lens settings. The calibration data is saved in a non-volatile memory on the assembly, allowing quick recovery after power cycles. Typical performance metrics include a uniformity value of 1.2% and a coherence stability of better than 0.02 over 24 hours.
Optical surfaces of the 879-0794-001 are coated with anti-reflective layers that require special cleaning procedures. Use only UV-grade methanol and optical-grade lint-free wipes; avoid any abrasive contact. The assembly should be inspected annually for coating degradation and contamination. The internal purge gas system (nitrogen) must be maintained at a positive pressure to prevent particle ingress. In case of significant energy loss, the entire assembly may need to be re-calibrated or have its diffuser replaced.
The Axiom assembly communicates with the stepper’s main controller via a dedicated CAN bus interface, providing real-time feedback on temperature, illumination level, and diffuser position. This allows the stepper to automatically adjust exposure dose and compensate for any drift. The assembly is also equipped with a series of photodiodes that monitor the beam profile, enabling predictive maintenance.
Built to high reliability standards, the 879-0794-001 has an MTBF exceeding 50,000 hours in continuous operation. It is designed for Class 10 cleanroom environments and can tolerate temperature variations from 20°C to 24°C. The assembly meets SEMI E49-0305 guidelines for shock and vibration resistance.
ASML offers a complete spare parts package for the 879-0794-001, including replacement diffusers, field lenses, and purge fittings. Technical documentation, including optical ray-tracing files and maintenance checklists, is available for certified service providers. Training courses on Axiom alignment are offered at ASML’s competence centers.
The ASML SVG 879-0794-001 Micrascan Axiom Assembly represents a sophisticated optical subsystem that ensures superior illumination uniformity and coherence control. Its robust design, precise adjustability, and seamless integration make it a cornerstone of high-accuracy Micrascan lithography.



