The NIKUNI 25KLD07Z-M is a high-performance magnetic drive centrifugal pump engineered for the safe handling of hazardous and ultra-pure chemicals. Manufactured by NIKUNI Co., Ltd., this KLD series pump is designed to completely eliminate leakage risks associated with traditional mechanical seals, making it the preferred choice for semiconductor fabs, PCB etching lines, photovoltaic cleaning, and chemical processing.
Model: 25KLD07Z-M
Product Type: Magnetic Drive Centrifugal Pump
Series: KLD Series (Compact Corrosion-Resistant Magnetic Pump)
Rated Flow Rate: 7 m³/h (approx. 116 L/min)
Maximum Head: 15 meters
Inlet/Outlet Diameter: DN25 (1 inch)
Motor Power: 0.75 kW (1 HP)
Power Supply: 3-phase 200–230 V / 50–60 Hz
Wetted Materials: PVDF (pump casing/impeller), ETFE (containment shell/inner magnet rotor coating)
Operating Temperature: -20°C to +90°C
Maximum Working Pressure: 1.0 MPa (10 bar)
Sealing Type: Totally seal-less (magnetic coupling drive)
Suitable Media: Hydrofluoric acid, sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid, ferric chloride etchants, ammonia, hydrogen peroxide, organic solvents
Certifications: CE, ISO 9001, SEMI F57 (on selective batches)
MTBF: >30,000 hours under rated conditions

The pump employs full plastic magnetic drive technology, completely eliminating mechanical seals. Torque is transmitted via non-contact magnetic coupling between the outer and inner magnets, achieving a fully enclosed pump chamber and absolute zero leakage. All wetted components are manufactured from high-grade fluoroplastics: PVDF provides excellent mechanical strength and heat resistance, while ETFE coating ensures long-term resistance against extreme chemicals. This design eliminates the risk of seal face wear, aging, or crystallization jamming.
Using 3D momentum exchange principles, the NIKUNI 25KLD07Z-M delivers stable pressure output even at low flow rates (minimum 0.2 L/min up to 110 L/min). It achieves single-stage impeller pressure of 17 kgf/cm² and two-stage impeller pressure of 30 kgf/cm², making it suitable for high-precision processes requiring consistent fluid delivery under varying backpressure conditions. The pump is suitable for cold/hot water circulation, chemical equipment integration, and general industrial fluid transfer.
This pump is ideal for semiconductor FAB buffer oxide etchant (BOE) delivery, PCB etching lines (FeCl₃), photovoltaic cleaning systems, chemical processing of strong acids, pharmaceutical and food-grade fluid transfer, environmental water treatment systems, and energy sector cooling and lubrication loops. Its seal-less construction ensures operator safety and environmental protection when handling highly hazardous media.



