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  • AMAT 0041-487230041-48723 Rev 02 Semiconductor manufacturing equipment parts
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  • AMAT 0041-487230041-48723 Rev 02 Semiconductor manufacturing equipment parts

    110V-380V
    5W-130W
    1A-30A
    1 year
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    United States, France, Japan, Viet Nam, Australia, Russia, Germany, Italy, Arabia

    AMAT 0041-487230041-48723 Rev 02 Semiconductor manufacturing equipment parts

    • ¥12000.00
      ¥23321.00
      ¥12000.00
      ¥12000.00
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    Weight:3.600KG
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    • (Inventory: 33)
Description

AMAT 0041-487230041-48723 Rev 02 Semiconductor manufacturing equipment parts


AMAT 0041-487230041-48723 Rev 02 Semiconductor manufacturing equipment parts

Deposition Process


CVD Parts: Chemical Vapor Deposition (CVD) is a key process in semiconductor manufacturing for depositing dielectric layers like SiO₂ and SiN, as well as metal films such as W and Cu. Parts like gas delivery systems, reaction chambers, and temperature control components are vital for precise and uniform film deposition.

PVD Parts: Physical Vapor Deposition (PVD) is another important deposition technique. Components like sputtering targets, cathodes, and vacuum pumps are essential for PVD processes, which are used to deposit thin films of metals and other materials on semiconductor wafers.

Etching Process


Etch Chamber Components: In the etching process, which is used to remove unwanted material from the wafer surface to create the desired circuit patterns, parts such as the etch chamber walls, electrodes, and gas distribution systems are critical. They need to withstand high temperatures and corrosive gases and ensure accurate and controlled etching.

Plasma Generation Parts: Plasma is often used in etching processes. Components like plasma generators, RF power supplies, and matching networks are responsible for generating and controlling the plasma, which interacts with the wafer to perform the etching.

CMP Process


Polishing Pads and Heads: Chemical Mechanical Polishing (CMP) is used to achieve a flat surface on the wafer. Polishing pads and heads are key parts in CMP equipment. The pads come into contact with the wafer surface and, together with the polishing slurry, remove material to achieve the desired flatness.

Slurry Delivery Systems: These systems supply the polishing slurry to the polishing pad and wafer interface. They include components like pumps, valves, and filters to ensure a consistent and accurate supply of the slurry.


AMAT 0041-487230041-48723 Rev 02 could be one of the many parts mentioned above or a part in other semiconductor manufacturing processes like ion implantation, lithography, or inspection.

Precautions for Use

Installation Environment: It should be installed in a dry, well - ventilated, dust - free, and non - corrosive gas environment. Avoid installing it in places with high temperature, high humidity, vibration, or strong electromagnetic interference.

Wiring Specifications: Wire strictly in accordance with the specifications and requirements of the terminal strip to ensure that the wires are firmly connected and avoid problems such as loose connections or short - circuits.

Load Matching: Select an appropriate power terminal strip according to the power and current requirements of the connected devices to ensure that it can bear the corresponding load.

Regular Maintenance: Regularly inspect and maintain the power terminal strip, clean dust and debris, check for loose connections, and promptly detect and address potential problems.


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